Field Ion Microscopy of Metals and Alloys after Intense External Influences

Ivchenko, V. A. (2023) Field Ion Microscopy of Metals and Alloys after Intense External Influences. In: Current Innovations in Chemical and Materials Sciences Vol. 2. B P International, pp. 100-114. ISBN 978-81-966927-2-8

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Abstract

The results of the study of modification of the crystal structure of metallic materials after intensive external influences on the atomic-spatial level are presented. The aim of the work is to demonstrate the effectiveness of the use of field emission and atomic probe methods for the study of nanomaterials and nano-structural states arising in volumes of metals and alloys after powerful external influences, including radiation exposure. Atom Probe Tomography (APT or 3D Atom Probe) is the only materials analysis method that offers extensive capabilities for both three-dimensional imaging and atomic-level chemical composition measurements (resolution of about 0.1–0.3 nm in depth and 0. 3–0.5 nm horizontally). The original results show the possibility of three-dimensional reconstruction of the elemental composition of mechanically alloyed alloys for the study of modification of the atomic structure. The modes of irradiation for the formation of amorphous states in the near-surface volumes of platinum have been determined. It has been established that the phenomenon of amorphisation of metals in surface volumes occurs up to the sample depth of 12 nm at the increase of fluence to 1018 ion/cm2 and the specified energies of irradiation. It has been determined that the nature of the crystalline structure of the boundary region of planar defects in metal materials directly depends on the type of external influence. The width of the boundary regions at metal partition boundaries has been found to vary between 0.8 and 1.5 nm depending on the type of intense external impact to which they were exposed.

Item Type: Book Section
Subjects: Eurolib Press > Chemical Science
Depositing User: Managing Editor
Date Deposited: 02 Nov 2023 08:27
Last Modified: 02 Nov 2023 08:27
URI: http://info.submit4journal.com/id/eprint/2885

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